US Patent Application 18360457. ACTIVE PATTERN STRUCTURE AND SEMICONDUCTOR DEVICE INCLUDING THE SAME simplified abstract
Contents
ACTIVE PATTERN STRUCTURE AND SEMICONDUCTOR DEVICE INCLUDING THE SAME
Organization Name
SAMSUNG ELECTRONICS CO., LTD.==Inventor(s)==
[[Category:Sangmoon Lee of Seoul (KR)]]
[[Category:Kyungin Choi of Suwon-si (KR)]]
[[Category:Seunghun Lee of Hwaseong-si (KR)]]
ACTIVE PATTERN STRUCTURE AND SEMICONDUCTOR DEVICE INCLUDING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 18360457 titled 'ACTIVE PATTERN STRUCTURE AND SEMICONDUCTOR DEVICE INCLUDING THE SAME
Simplified Explanation
The patent application describes an active pattern structure with specific components and their arrangement.
- The structure includes a lower active pattern that sticks out from the substrate's upper surface in a vertical direction.
- A buffer structure is present on the lower active pattern, potentially containing aluminum silicon oxide.
- An upper active pattern is placed on top of the buffer structure.
Original Abstract Submitted
An active pattern structure includes a lower active pattern protruding from an upper surface of a substrate in a vertical direction substantially perpendicular to an upper surface of the substrate, a buffer structure on the lower active pattern, at least a portion of which may include aluminum silicon oxide, and an upper active pattern on the buffer structure.
