US Patent Application 18356157. CHANNEL DEVICE AND MANUFACTURING METHOD THEREOF simplified abstract

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CHANNEL DEVICE AND MANUFACTURING METHOD THEREOF

Organization Name

FUJIFILM Corporation

Inventor(s)

Aya Mochizuki of Kanagawa (JP)

Hiroyuki Yukawa of Kanagawa (JP)

Kenichi Yasuda of Kanagawa (JP)

Takahiro Oba of Kanagawa (JP)

CHANNEL DEVICE AND MANUFACTURING METHOD THEREOF - A simplified explanation of the abstract

This abstract first appeared for US patent application 18356157 titled 'CHANNEL DEVICE AND MANUFACTURING METHOD THEREOF

Simplified Explanation

The present disclosure describes a channel device that includes a flow channel formed in a substrate and a porous membrane with pores that communicate in a direction intersecting its thickness.

  • The porous membrane is in contact with the substrate and is sealed tightly along the flow channel to prevent leakage of liquid.
  • The channel device is designed to facilitate the flow of fluids through the flow channel while maintaining a liquid-tight seal.
  • The device can be used in various applications, such as filtration systems, microfluidic devices, or chemical reactors.
  • The manufacturing method of the channel device is also disclosed, which involves forming a groove in the substrate and sealing the porous membrane along the flow channel.


Original Abstract Submitted

The present disclosure provides a channel device () including a flow channel () formed of a groove () provided in a substrate () and a porous membrane () having pores () communicating in a direction intersecting a thickness direction thereof, in which at least a portion of the porous membrane () in contact with the substrate () is liquid-tightly sealed along the flow channel (), and a manufacturing method thereof.