US Patent Application 18355273. INTEGRATED CIRCUIT DEVICE AND METHOD simplified abstract
Contents
INTEGRATED CIRCUIT DEVICE AND METHOD
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.
Inventor(s)
Hui-Zhong Zhuang of Hsinchu (TW)
Yung-Chen Chien of Hsinchu (TW)
Jerry Chang Jui Kao of Hsinchu (TW)
Chung-Hsing Wang of Hsinchu (TW)
INTEGRATED CIRCUIT DEVICE AND METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18355273 titled 'INTEGRATED CIRCUIT DEVICE AND METHOD
Simplified Explanation
The patent application describes an integrated circuit (IC) device that includes a substrate, active regions, gate regions, and input/output (IO) patterns.
- The IC device has a substrate, which is a base material for the circuit.
- The active regions are areas on the substrate that perform specific functions.
- The gate regions extend across the active regions and control their operation.
- The IO patterns are designed to connect the active regions and gate regions to other circuitry.
- The IO patterns are positioned obliquely to the active regions or gate regions, meaning they are not aligned in a straight line.
- This configuration allows for more efficient electrical coupling between the active regions, gate regions, and other circuitry.
- The innovation in this patent application is the oblique positioning of the IO patterns, which improves the performance and functionality of the IC device.
Original Abstract Submitted
An integrated circuit (IC) device includes a substrate, at least one active region over the substrate and elongated along a first axis, at least one gate region extending across the at least one active region, and at least one input/output (IO) pattern configured to electrically couple one or more of the at least one active region and the at least one gate region to other circuitry. The at least one IO pattern extends obliquely to the at least one active region or the at least one gate region.
