US Patent Application 18353266. BAND-PASS FILTER FOR STACKED SENSOR simplified abstract
Contents
BAND-PASS FILTER FOR STACKED SENSOR
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.
Inventor(s)
Cheng Yu Huang of Hsinchu (TW)
Chun-Hao Chuang of Hsinchu City (TW)
Chien-Hsien Tseng of Hsinchu (TW)
Kazuaki Hashimoto of Zhubei City (TW)
Keng-Yu Chou of Kaohsiung City (TW)
Wei-Chieh Chiang of Yuanlin Township (TW)
Wen-Hau Wu of New Taipei City (TW)
BAND-PASS FILTER FOR STACKED SENSOR - A simplified explanation of the abstract
This abstract first appeared for US patent application 18353266 titled 'BAND-PASS FILTER FOR STACKED SENSOR
Simplified Explanation
- The patent application describes an integrated chip structure that includes two image sensor elements, each capable of generating electrical signals from different ranges of wavelengths. - A band-pass filter is formed over one of the image sensor elements using a series of deposition processes. - The band-pass filter consists of alternating layers of two different materials with different refractive indices. - The first image sensor element is then bonded to the band-pass filter. - The purpose of the band-pass filter is to selectively allow certain wavelengths of electromagnetic radiation to pass through to the image sensor element, while blocking others. - This integrated chip structure could potentially be used in various applications that require the detection and analysis of electromagnetic radiation within specific wavelength ranges.
Original Abstract Submitted
In some embodiments, the present disclosure relates to an integrated chip structure. The integrated chip structure includes forming a first image sensor element within a first substrate and a second image sensor element within a second substrate. The first image sensor element is configured to generate electrical signals from electromagnetic radiation within a first range of wavelengths and the second image sensor element is configured to generate electrical signals from electromagnetic radiation within a second range of wavelengths. A plurality of deposition processes are performed to form a band-pass filter over the second substrate. The band-pass filter has a plurality of alternating layers of a first material having a first refractive index and a second material having a second refractive index that is less than the first refractive index. The first substrate is bonded to the band-pass filter.
