US Patent Application 18349267. MULTI-TERMINAL GALLIUM NITRIDE POWER TRANSISTOR simplified abstract

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MULTI-TERMINAL GALLIUM NITRIDE POWER TRANSISTOR

Organization Name

HUAWEI TECHNOLOGIES CO., LTD.


Inventor(s)

Gilberto Curatola of Nuremberg (DE)

MULTI-TERMINAL GALLIUM NITRIDE POWER TRANSISTOR - A simplified explanation of the abstract

This abstract first appeared for US patent application 18349267 titled 'MULTI-TERMINAL GALLIUM NITRIDE POWER TRANSISTOR

Simplified Explanation

The patent application is about a Gallium Nitride (GaN) power transistor.

  • GaN power transistor with multiple unit cells
  • Each unit cell has a source region, a drain region, and a gate region
  • Source metallization layer connects the source regions to the source pad
  • Drain metallization layer connects the drain regions to the drain pad
  • First gate metallization layer connects the gate region of some unit cells to the first gate pad
  • Second gate metallization layer connects the gate region of other unit cells to the second gate pad


Original Abstract Submitted

The present disclosure relates to a Gallium Nitride (GaN) power transistor. The GaN power transistor includes a source pad, a drain pad, a first and a second gate pad, a plurality of unit cells where each unit cell includes a source region, a drain region and a gate region. The power transitory further includes a source metallization layer contacting the source regions of the plurality of unit cells with the source pad, a drain metallization layer contacting the drain regions of the plurality of unit cells with the drain pad, a first gate metallization layer contacting the gate region of a first portion of the unit cells with the first gate pad, and a second gate metallization layer contacting the gate region of a second portion of the unit cells with the second gate pad.