US Patent Application 18347961. METHOD OF CLEANING A NOZZLE simplified abstract
Contents
METHOD OF CLEANING A NOZZLE
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.
Inventor(s)
Guan Jung Chen of Hsinchu (TW)
Chia-Hung Tsai of Hsinchu (TW)
METHOD OF CLEANING A NOZZLE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18347961 titled 'METHOD OF CLEANING A NOZZLE
Simplified Explanation
The abstract describes a method for cleaning a nozzle in a gas supply system using an automated nozzle cleaning system.
- An apparatus with a carrier and an automated nozzle cleaning system is loaded onto a gas supply system.
- The carrier is positioned to connect the gas inlet of the carrier to the nozzle of the gas supply system.
- The first nozzle cleaning device vacuums contaminant particles from the nozzle.
- The second nozzle cleaning device mechanically removes the contaminant particles from the nozzle.
- The monitoring device measures the level of contaminant particles.
Original Abstract Submitted
A method of cleaning a nozzle of a gas supply system includes loading an apparatus including a carrier and an automated nozzle cleaning system in the carrier onto a load port containing a gas supply system. The automated nozzle cleaning system includes a first nozzle cleaning device, a second nozzle cleaning device and a monitoring device, and the carrier is positioned to enable a gas inlet of the carrier to be connected to a nozzle of the gas supply system. The method also includes vacuuming contaminant particles from the nozzle using the first nozzle cleaning device, mechanically removing the contaminant particles adhering to the nozzle off the nozzle using the second nozzle cleaning device, and measuring a level of the contaminant particles using the monitoring device.
