US Patent Application 18338716. PLANARIZATION METHOD AND PHOTOCURABLE COMPOSITION simplified abstract
Contents
PLANARIZATION METHOD AND PHOTOCURABLE COMPOSITION
Organization Name
Inventor(s)
Timothy Stachowiak of Austin TX (US)
Keiji Yamashita of Tochigi (JP)
PLANARIZATION METHOD AND PHOTOCURABLE COMPOSITION - A simplified explanation of the abstract
- This abstract for appeared for US patent application number 18338716 Titled 'PLANARIZATION METHOD AND PHOTOCURABLE COMPOSITION'
Simplified Explanation
The abstract describes a method for making a substrate surface smooth. It involves applying a liquid substance onto the uneven surface, waiting for it to become smooth, and then using light to harden the substance. The method includes two steps: first, applying a layer of a liquid substance containing a polymerizable compound, and second, dropping droplets of another liquid substance containing a different polymerizable compound onto the first layer.
Original Abstract Submitted
A substrate surface planarization method includes an arranging step of arranging a liquid curable composition onto a substrate surface having unevenness, a waiting step of waiting until the surface of the layer of the liquid curable composition becomes smooth, and a light exposure step of applying light to cure the layer of the liquid curable composition in this order. The arranging step includes a first arranging step of arranging a layer made of a first liquid curable composition (A1) containing at least a polymerizable compound (a1), and a second arranging step of arranging droplets of a second liquid curable composition (A2) containing at least a polymerizable compound (a2) onto the layer made of the first liquid curable composition (A1) by dropping the droplets discretely.
