US Patent Application 18323684. Fabric Processing Device simplified abstract

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Fabric Processing Device

Organization Name

SEIKO EPSON CORPORATION

Inventor(s)

Hirokazu Sekino of Chino (JP)

Osamu Katsuda of Matsumoto (JP)

Takeshi Seto of Shiojiri (JP)

Fabric Processing Device - A simplified explanation of the abstract

This abstract first appeared for US patent application 18323684 titled 'Fabric Processing Device

Simplified Explanation

The patent application describes a fabric processing device that improves the texture of fabric by ejecting a liquid onto it.

  • The device includes a transport unit, a support unit, and a liquid ejecting unit.
  • The transport unit moves the fabric in a specific direction.
  • The support unit holds the fabric in place.
  • The liquid ejecting unit sprays a liquid onto the fabric.
  • The liquid is ejected at a high speed of 30 m/s or more.
  • The liquid is sprayed onto the fabric as droplets, which collide with the fabric.
  • This collision helps to process the fabric and improve its texture.
  • The device effectively enhances the texture of the fabric.


Original Abstract Submitted

A fabric processing device includes a transport unit configured to transport a fabric in a transport direction; a support unit configured to support the fabric; and a liquid ejecting unit configured to eject a liquid onto the fabric supported by the support unit. The liquid ejecting unit is configured to eject the liquid in a continuous flow at an ejecting speed of 30 m/s or more, and the liquid ejected as the continuous flow is caused to collide with the fabric in a state of being liquid droplets to process the fabric. The fabric processing device having such a configuration can effectively improve texture of the fabric.