US Patent Application 18313555. PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF PREPARING THE PHOTOACID GENERATOR simplified abstract
PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF PREPARING THE PHOTOACID GENERATOR
Inventors
Hyunwoo Kim of Seongnam-si (KR)
Juhyeon Park of Hwaseong-si (KR)
Byunghee Sohn of Yongin-si (KR)
Sungwon Choi of Hwaseong-si (KR)
PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF PREPARING THE PHOTOACID GENERATOR - A simplified explanation of the abstract
- This abstract for appeared for patent application number 18313555 Titled 'PHOTOACID GENERATOR, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF PREPARING THE PHOTOACID GENERATOR'
Simplified Explanation
The abstract describes a photoacid generator, which is a chemical compound used in photoresist compositions. The photoresist composition is a material used in the manufacturing of electronic devices. The abstract also mentions a method of preparing the photoacid generator. The photoacid generator is represented by a specific chemical formula (Formula 1), although the formula itself is not provided in the abstract.
Original Abstract Submitted
Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1:
