US Patent Application 18303077. PRINT ELEMENT SUBSTRATE AND METHOD FOR MANUFACTURING PRINT ELEMENT SUBSTRATE simplified abstract

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PRINT ELEMENT SUBSTRATE AND METHOD FOR MANUFACTURING PRINT ELEMENT SUBSTRATE

Organization Name

CANON KABUSHIKI KAISHA


Inventor(s)

KEIJI Matsumoto of Kanagawa (JP)


KAZUHIRO Asai of Kanagawa (JP)


PRINT ELEMENT SUBSTRATE AND METHOD FOR MANUFACTURING PRINT ELEMENT SUBSTRATE - A simplified explanation of the abstract

  • This abstract for appeared for US patent application number 18303077 Titled 'PRINT ELEMENT SUBSTRATE AND METHOD FOR MANUFACTURING PRINT ELEMENT SUBSTRATE'

Simplified Explanation

The abstract describes a substrate used in printing technology. The substrate includes an energy generating element that helps eject liquid from a specific point. It also includes a flow passage forming member that supplies the liquid to the ejection point. The flow passage forming member has a cavity that does not connect to the flow passage. The side surface of the cavity is perpendicular to the substrate, and there is a base film between the cavity and the substrate. The refractive index of the flow passage forming member is lower than the refractive index of the base film, and the difference between the two refractive indices is at least 0.3.


Original Abstract Submitted

A print element substrate including a substrate having an energy generating element that generates energy for ejecting liquid from an ejection port and a flow passage forming member including a flow passage that supplies the liquid to the ejection port, wherein the flow passage forming member includes a cavity not communicating with the flow passage, and a side surface of the cavity is formed substantially perpendicular to the substrate wherein a base film is formed between the cavity and the substrate. The refractive index of the flow passage forming member is lower than the refractive index of the base film, and the difference between the refractive index of the flow passage forming member and the refractive index of the base film is greater than or equal to 0.3.

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