US Patent Application 18296044. EXPOSURE APPARATUS, EXPOSURE METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract
Contents
EXPOSURE APPARATUS, EXPOSURE METHOD, AND ARTICLE MANUFACTURING METHOD
Organization Name
Inventor(s)
TAKAHIRO Takiguchi of Tochigi (JP)
EXPOSURE APPARATUS, EXPOSURE METHOD, AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
- This abstract for appeared for US patent application number 18296044 Titled 'EXPOSURE APPARATUS, EXPOSURE METHOD, AND ARTICLE MANUFACTURING METHOD'
Simplified Explanation
This abstract describes an exposure apparatus that is used to expose a substrate using a projection optical system. The apparatus includes a temperature regulator that controls the temperature distribution on an optical element of the projection optical system. During the exposure operation, a controller performs a first process to minimize the change in aberration of the projection optical system. However, if a specific event is detected before the exposure operation, the controller performs a second process to reduce the aberration using a different method than the first process.
Original Abstract Submitted
An exposure apparatus that performs an exposure operation of exposing a substrate via a projection optical system is provided. The apparatus includes a temperature regulator configured to regulate a temperature distribution on an optical element of the projection optical system, and a controller configured to perform, in an exposure operation period in which the exposure operation is executed, a first process of controlling the temperature regulator so as to reduce a change of aberration of the projection optical system caused by execution of the exposure operation. In accordance with detection of a predetermined event before the exposure operation period, the controller performs, before performing the first process, a second process for reducing the aberration of the projection optical system using a method different from the first process.
