US Patent Application 18246241. MULTILAYER ARTICLES INCLUDING AN ABSORBENT LAYER AND AN ULTRAVIOLET MIRROR, SYSTEMS, DEVICES, AND METHODS OF DISINFECTING simplified abstract
MULTILAYER ARTICLES INCLUDING AN ABSORBENT LAYER AND AN ULTRAVIOLET MIRROR, SYSTEMS, DEVICES, AND METHODS OF DISINFECTING
Organization Name
3M INNOVATIVE PROPERTIES COMPANY
Inventor(s)
Timothy J. Hebrink of Scandia MN (US)
John A. Wheatley of Stillwater MN (US)
Bharat R. Acharya of Woodbury MN (US)
MULTILAYER ARTICLES INCLUDING AN ABSORBENT LAYER AND AN ULTRAVIOLET MIRROR, SYSTEMS, DEVICES, AND METHODS OF DISINFECTING - A simplified explanation of the abstract
This abstract first appeared for US patent application 18246241 titled 'MULTILAYER ARTICLES INCLUDING AN ABSORBENT LAYER AND AN ULTRAVIOLET MIRROR, SYSTEMS, DEVICES, AND METHODS OF DISINFECTING
Simplified Explanation
- The patent application describes multilayer articles that include an absorbent layer and an ultraviolet mirror. - The absorbent layer is designed to absorb ultraviolet light with a wavelength between 230 nm and 400 nm. - The ultraviolet mirror is made up of alternating first and second optical layers and is capable of reflecting ultraviolet light in the range of 190 nm to 240 nm. - Systems are also described that include a broadband UVC light source and the multilayer article. - Devices are provided that consist of a chamber, a broadband UVC light source, an absorbent layer, and an ultraviolet mirror. - The methods described involve using the system or device to direct UVC light at the ultraviolet mirror and exposing materials to the reflected ultraviolet light in the range of 190 nm to 240 nm for disinfection purposes.
Original Abstract Submitted
Multilayer articles are provided, including an absorbent layer and an ultraviolet mirror containing at least a plurality of alternating first and second optical layers. The absorbent layer absorbs ultraviolet light having a wavelength between at least 230 nanometers (nm) and 400 nm. The ultraviolet mirror reflects ultraviolet light in a wavelength range from 190 nm to 240 nm. Systems are also provided including a broadband UVC light source and a multilayer article. Devices are provided including a chamber, a broadband UVC light source located within the chamber, an absorbent layer in the chamber, and an ultraviolet mirror between the light source and absorbent layer. Methods of disinfecting a material are further provided, including obtaining a system or device, directing UVC light at the ultraviolet mirror, and exposing the material to ultraviolet light in a wavelength range from 190 nm to 240 nm, reflected by the ultraviolet mirror towards the material.
