US Patent Application 18234147. MAGNETORESISTANCE EFFECT ELEMENT simplified abstract

From WikiPatents
Jump to navigation Jump to search

MAGNETORESISTANCE EFFECT ELEMENT

Organization Name

TDK CORPORATION

Inventor(s)

Tomoyuki Sasaki of Tokyo (JP)

MAGNETORESISTANCE EFFECT ELEMENT - A simplified explanation of the abstract

This abstract first appeared for US patent application 18234147 titled 'MAGNETORESISTANCE EFFECT ELEMENT

Simplified Explanation

The patent application describes a magnetoresistance effect element consisting of two ferromagnetic metal layers and a tunnel barrier layer in between.

  • The tunnel barrier layer is made up of a chemical compound expressed as ABO and has a disordered spinel structure.
  • A represents either Mg or Zn, which are divalent cations.
  • B represents a trivalent cation that can be Al, Ga, or In, among others.
  • The innovation lies in the specific composition and structure of the tunnel barrier layer, which enhances the magnetoresistance effect in the element.


Original Abstract Submitted

A magnetoresistance effect element has a first ferromagnetic metal layer, a second ferromagnetic metal layer, and a tunnel barrier layer that is sandwiched between the first and second ferromagnetic metal layers, the tunnel barrier layer is expressed by a chemical formula of ABO, and has a spinel structure in which cations are arranged in a disordered manner, A represents a divalent cation that is either Mg or Zn, and B represents a trivalent cation that includes a plurality of elements selected from the group consisting of Al, Ga, and In.