US Patent Application 18229556. FILTER APPARATUS FOR SEMICONDUCTOR DEVICE FABRICATION PROCESS simplified abstract
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Contents
FILTER APPARATUS FOR SEMICONDUCTOR DEVICE FABRICATION PROCESS
Organization Name
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Inventor(s)
Chih-Chiang Tseng of Hsinchu (TW)
Tzu-Sou Chuang of Hsinchu (TW)
FILTER APPARATUS FOR SEMICONDUCTOR DEVICE FABRICATION PROCESS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18229556 titled 'FILTER APPARATUS FOR SEMICONDUCTOR DEVICE FABRICATION PROCESS
Simplified Explanation
The patent application describes a filter device that consists of one or more filter membranes and a filter housing.
- The filter membranes are made up of a base membrane and several through holes.
- The filter housing encloses the filter membranes, providing a protective casing.
- The through holes in the filter membranes allow for the filtration of substances passing through the device.
- The filter device is designed to effectively separate and remove impurities from fluids or gases.
- The invention aims to improve the efficiency and performance of filtration processes.
- The filter device can be used in various applications, such as water purification, air filtration, or industrial processes.
Original Abstract Submitted
A filter device includes one or more filter membranes, and a filter housing enclosing the one or more filter membranes. Each of the filter membranes includes a base membrane and a plurality of through holes.
