US Patent Application 18224005. APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION simplified abstract

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APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION

Organization Name

Taiwan Semiconductor Manufacturing Company, Ltd.


Inventor(s)

Wei-Chih Lai of Changhua County (TW)

Han-Lung Chang of Kaohsiung City (TW)

Chi Yang of Tainan City (TW)

Shang-Chieh Chien of New Taipei City (TW)

Bo--Tsun Liu of Taipei City (TW)

Li-Jui Chen of Hsinchu City (TW)

Po-Chung Cheng of Chiayi County (TW)

APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION - A simplified explanation of the abstract

This abstract first appeared for US patent application 18224005 titled 'APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION

Simplified Explanation

The abstract describes a target droplet source for an extreme ultraviolet (EUV) source. This source includes a droplet generator that produces target droplets of a specific material. The droplet generator has a nozzle that supplies the target droplets within a chamber. Additionally, there is a sleeve located in the chamber, which guides the target droplets along a specific path.

  • The patent application is for a target droplet source used in extreme ultraviolet (EUV) sources.
  • The source includes a droplet generator that produces target droplets made of a specific material.
  • The droplet generator has a nozzle that supplies the target droplets into a chamber.
  • A sleeve is placed in the chamber, providing a path for the target droplets.
  • The sleeve helps guide the target droplets along a specific trajectory within the chamber.


Original Abstract Submitted

A target droplet source for an extreme ultraviolet (EUV) source includes a droplet generator configured to generate target droplets of a given material. The droplet generator includes a nozzle configured to supply the target droplets in a space enclosed by a chamber. The target droplet source further includes a sleeve disposed in the chamber distal to the nozzle. The sleeve is configured to provide a path for the target droplets in the chamber.

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