US Patent Application 18210551. METHOD OF FABRICATING AND SERVICING A PHOTOMASK simplified abstract
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Contents
METHOD OF FABRICATING AND SERVICING A PHOTOMASK
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.
Inventor(s)
Chun-Fu Yang of Kaohsiung City (TW)
Ta-Cheng Lien of Cyonglin Township (TW)
Hsin-Chang Lee of Zhubei City (TW)
METHOD OF FABRICATING AND SERVICING A PHOTOMASK - A simplified explanation of the abstract
- This abstract for appeared for US patent application number 18210551 Titled 'METHOD OF FABRICATING AND SERVICING A PHOTOMASK'
Simplified Explanation
The abstract describes a method for removing contamination from a photomask using plasma processing. The contaminated photomask is placed in a plasma processing chamber and treated with either oxygen plasma or hydrogen plasma to remove the contamination from its surface.
Original Abstract Submitted
A method includes placing a photomask having a contamination on a surface thereof in a plasma processing chamber. The contaminated photomask is plasma processed in the plasma processing chamber to remove the contamination from the surface. The plasma includes oxygen plasma or hydrogen plasma.
