US Patent Application 18205318. LAMINATED FILM STRUCTURE AND METHOD FOR MANUFACTURING LAMINATED FILM STRUCTURE simplified abstract

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LAMINATED FILM STRUCTURE AND METHOD FOR MANUFACTURING LAMINATED FILM STRUCTURE

Organization Name

Panasonic Intellectual Property Management Co., Ltd.

Inventor(s)

Kazuya Shimada of Aichi (JP)

Masahito Hayamizu of Aichi (JP)

Toshihiko Sakata of Nara (JP)

Makoto Chakuno of Osaka (JP)

LAMINATED FILM STRUCTURE AND METHOD FOR MANUFACTURING LAMINATED FILM STRUCTURE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18205318 titled 'LAMINATED FILM STRUCTURE AND METHOD FOR MANUFACTURING LAMINATED FILM STRUCTURE

Simplified Explanation

- The patent application describes a method for forming a metal film on a surface of an object. - The method involves first forming an oxide layer on the surface of the object by contacting it with a reaction solution containing fluorine and an oxide precursor. - The fluorine in the oxide layer is then removed. - A catalyst is then supported on the oxide layer by contacting it with a catalyst solution. - Finally, a metal film is deposited on the oxide layer by contacting it with an electroless plating liquid.

  • The method involves a multi-step process for forming a metal film on an object's surface.
  • The first step is to form an oxide layer on the surface by using a reaction solution containing fluorine and an oxide precursor.
  • The fluorine in the oxide layer is then removed, likely to improve the properties of the oxide layer.
  • A catalyst is then applied to the oxide layer using a catalyst solution, which may enhance the subsequent metal deposition process.
  • The final step is to deposit a metal film on the oxide layer using an electroless plating liquid, which allows for a controlled and uniform metal coating.


Original Abstract Submitted

Method for forming a metal film includes forming an oxide layer on a to-be-treated surface of a to-be-treated object by bringing the to-be-treated surface into contact with a reaction solution containing fluorine and an oxide precursor, removing fluorine in the oxide layer, supporting a catalyst on the oxide layer by bringing the oxide layer into contact with a catalyst solution, and depositing a metal film on the oxide layer by bringing the oxide layer into contact with an electroless plating liquid.