US Patent Application 18141674. LOW RESIDUAL LAYER THICKNESS WAVEGUIDE WITH HIGH-INDEX COATING simplified abstract
Contents
LOW RESIDUAL LAYER THICKNESS WAVEGUIDE WITH HIGH-INDEX COATING
Organization Name
Inventor(s)
Eliezer Glik of San Diego CA (US)
Shreyas Potnis of Kitchener (CA)
LOW RESIDUAL LAYER THICKNESS WAVEGUIDE WITH HIGH-INDEX COATING - A simplified explanation of the abstract
This abstract first appeared for US patent application 18141674 titled 'LOW RESIDUAL LAYER THICKNESS WAVEGUIDE WITH HIGH-INDEX COATING
Simplified Explanation
The patent application describes a method to improve the field of view and color bandwidth of a waveguide without using high-index resin.
- Waveguide grating is formed on a substrate with a low-index resin and a high refractive index conformal coating.
- Nano imprint lithography is used to imprint the substrate with the resin, minimizing the thickness of the resin layer.
- The conformal coating uniformly coats the surface with a consistent thickness, conforming to its geometry.
Original Abstract Submitted
To increase the field of view and/or the wavelengths of light (i.e., color bandwidth) transmitted by a waveguide without using high-index resin, some embodiments include a waveguide grating formed on a substrate that is imprinted with a relatively low-index resin and a conformal coating having a relatively high refractive index. In some embodiments, the substrate is imprinted with the resin using nano imprint lithography and the residual layer thickness of the resin layer is minimized. The conformal coating conforms to the geometry of the surface it coats with a substantially uniform thickness.
