US Patent Application 18130014. MANUFACTURING METHOD OF IMAGE SENSOR simplified abstract
Contents
MANUFACTURING METHOD OF IMAGE SENSOR
Organization Name
Inventor(s)
MANUFACTURING METHOD OF IMAGE SENSOR - A simplified explanation of the abstract
This abstract first appeared for US patent application 18130014 titled 'MANUFACTURING METHOD OF IMAGE SENSOR
Simplified Explanation
The patent application describes a manufacturing method for an image sensor.
- The method involves forming a color filter layer over a matrix of pixel regions on a substrate.
- The color filter layer is then patterned using a mask with patterns arranged diagonally in the matrix.
- This forms color filters for some of the pixel regions on the substrate.
- Each pattern in the mask includes a rectangular main pattern and sub-patterns extending from the corners of the main pattern.
- The sizes of the sub-patterns in adjacent patterns that face each other are smaller than the other sub-patterns in those adjacent patterns.
Original Abstract Submitted
A manufacturing method of an image sensor includes, operations of: forming a color filter layer over a plurality of pixel regions having a plurality of photodetectors and arranged in a matrix on a substrate, and patterning the color filter layer with a mask including patterns disposed adjacently in a diagonal direction of the matrix, to form color filters for some of the plurality of pixel regions on the substrate. Each of the patterns may include a rectangular main pattern and sub-patterns outwardly extending from corners of the main patterns. Sizes of sub-patterns of different adjacent patterns that face each other may have sizes that are smaller than other sub-patterns of the adjacent patterns.
