US Patent Application 18106254. RESIST COMPOUND AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract
Contents
RESIST COMPOUND AND METHOD OF FORMING PATTERN USING THE SAME
Organization Name
Inventor(s)
Youngkwan Lee of Suwon-si (KR)
Hyungjun Chee of Suwon-si (KR)
RESIST COMPOUND AND METHOD OF FORMING PATTERN USING THE SAME - A simplified explanation of the abstract
- This abstract for appeared for US patent application number 18106254 Titled 'RESIST COMPOUND AND METHOD OF FORMING PATTERN USING THE SAME'
Simplified Explanation
The abstract states that there is a compound called resist, which is represented by Formula 1. It does not provide any further information about the compound or its properties.
Original Abstract Submitted
A resist compound is represented by Formula 1:
