US Patent Application 18106254. RESIST COMPOUND AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract
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RESIST COMPOUND AND METHOD OF FORMING PATTERN USING THE SAME
Organization Name
Inventor(s)
Youngkwan Lee of Suwon-si (KR)
Hyungjun Chee of Suwon-si (KR)
RESIST COMPOUND AND METHOD OF FORMING PATTERN USING THE SAME - A simplified explanation of the abstract
- This abstract for appeared for US patent application number 18106254 Titled 'RESIST COMPOUND AND METHOD OF FORMING PATTERN USING THE SAME'
Simplified Explanation
The abstract states that there is a compound called resist, which is represented by Formula 1. It does not provide any further information about the compound or its properties.
Original Abstract Submitted
A resist compound is represented by Formula 1:
