US Patent Application 18102514. APPARATUS AND METHOD FOR INSPECTING AND MEASURING SEMICONDUCTOR DEVICE simplified abstract
Contents
APPARATUS AND METHOD FOR INSPECTING AND MEASURING SEMICONDUCTOR DEVICE
Organization Name
Inventor(s)
Hyeongcheol Lee of Suwon-si (KR)
APPARATUS AND METHOD FOR INSPECTING AND MEASURING SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
- This abstract for appeared for US patent application number 18102514 Titled 'APPARATUS AND METHOD FOR INSPECTING AND MEASURING SEMICONDUCTOR DEVICE'
Simplified Explanation
The abstract describes an apparatus used for inspecting and measuring a semiconductor device. The apparatus consists of a stage where the object to be measured is placed, a detector that detects a spectral image by capturing light reflected from the object, and a processor that generates a spectral matrix using the detected spectral image. The detector specifically includes a time delayed integration (TDI) sensor, which uses a TDI process to capture the spectral image.
Original Abstract Submitted
An apparatus for inspecting and measuring a semiconductor device includes a stage on which an object to be measured is provided, a detector configured to detect a spectral image from light reflected from the object to be measured, and a processor configured to generate a spectral matrix based on the spectral image detected by the detector, wherein detector includes a time delayed integration (TDI) sensor configured to detect the spectral image based on a TDI process.
