US Patent Application 17994181. SUBSTRATE PROCESSING METHOD simplified abstract
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Contents
SUBSTRATE PROCESSING METHOD
Inventors
MINJUNG Kim of HWASEONG-SI (KR)
HYUNGSUK Moon of SEONGNAM-SI (KR)
SEUNGKOO Shin of POHANG-SI (KR)
HYEJOO Yoon of SEONGNAM-SI (KR)
SUBSTRATE PROCESSING METHOD - A simplified explanation of the abstract
- This abstract for appeared for patent application number 17994181 Titled 'SUBSTRATE PROCESSING METHOD'
Simplified Explanation
The abstract describes a method for processing a substrate, which involves several steps. First, a silicon film is formed on the substrate. Then, the silicon film is exposed to microwaves. Finally, the silicon film is soaked in liquid heavy water.
Original Abstract Submitted
A substrate processing method includes; forming a silicon film on a substrate, irradiating the silicon film with microwaves, and soaking the silicon film in liquid heavy water.
