US Patent Application 17964376. SPIN COATER simplified abstract

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SPIN COATER

Organization Name

Samsung Electronics Co., Ltd.


Inventor(s)

Sunghwan Kim of Suwon-si (KR)


Kyungwon Kang of Suwon-si (KR)


Dongwook Kim of Suwon-si (KR)


Seungjoon Song of Suwon-si (KR)


Seok Heo of Suwon-si (KR)


Younseon Wang of Suwon-si (KR)


Dasom Lee of Suwon-si (KR)


SPIN COATER - A simplified explanation of the abstract

  • This abstract for appeared for US patent application number 17964376 Titled 'SPIN COATER'

Simplified Explanation

The abstract describes a spin coater, a machine used in the manufacturing of electronic devices. The spin coater consists of a spin chuck, a nozzle, and two temperature controllers. The spin chuck is responsible for rotating the substrate while applying photoresist, a light-sensitive material used in the production process. The nozzle is positioned above the spin chuck and dispenses the photoresist onto the substrate. The first temperature controller regulates the temperature in one area of the spin chuck, while the second temperature controller controls the temperature in another area.


Original Abstract Submitted

A spin coater may include a spin chuck, a nozzle, a first temperature controller and a second temperature controller. The spin chuck may be configured make contact with a central portion of a lower surface of a substrate and may be configured to rotate the substrate when photoresist is on the substrate. The nozzle may be arranged over a central portion of the spin chuck and configured to provide a central portion of an upper surface of the substrate with photoresist. The first temperature controller may be configured to control a temperature in a first region of the spin chuck. The second temperature controller may be configured to control a temperature in a second region of the spin chuck.