US Patent Application 17811109. Self-Aligned Acoustic Hole Formation in Piezoelectrical MEMS Microphone simplified abstract
Contents
Self-Aligned Acoustic Hole Formation in Piezoelectrical MEMS Microphone
Organization Name
Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor(s)
Ting-Jung Chen of Kaohsiung City (TW)
Self-Aligned Acoustic Hole Formation in Piezoelectrical MEMS Microphone - A simplified explanation of the abstract
This abstract first appeared for US patent application 17811109 titled 'Self-Aligned Acoustic Hole Formation in Piezoelectrical MEMS Microphone
Simplified Explanation
The patent application describes a process for creating a membrane with piezoelectric layers and electrodes.
- The process involves depositing multiple layers of piezoelectric material and electrode material.
- The electrodes are patterned to form distinct areas.
- A through-hole is created by etching the layers of piezoelectric material.
- The through-hole is positioned away from the electrodes.
- Contact plugs are formed to connect to the electrodes.
Original Abstract Submitted
A membrane is formed through processes including depositing a first piezoelectrical layer, depositing a first electrode layer over the first piezoelectrical layer, patterning the first electrode layer to form a first electrode, depositing a second piezoelectrical layer over the first electrode, depositing a second electrode layer over the second piezoelectrical layer, patterning the second electrode layer to form a second electrode, and depositing a third piezoelectrical layer over the second electrode. The third piezoelectrical layer, the second piezoelectrical layer, and the first piezoelectrical layer are etched to form a through-hole. The through-hole is laterally spaced apart from the first electrode and the second electrode. A first contact plug and a second contact plug are then formed to electrically connect to the first electrode and the second electrode, respectively.
