US Patent Application 17723372. MULTI-CHAMBER SEMICONDUCTOR PROCESSING SYSTEM WITH TRANSFER ROBOT TEMPERATURE ADJUSTMENT simplified abstract

MULTI-CHAMBER SEMICONDUCTOR PROCESSING SYSTEM WITH TRANSFER ROBOT TEMPERATURE ADJUSTMENT

Organization Name

Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor(s)

Chia-Hsi Wang of Changhua County (TW)

Yen-Yu Chen of Taichung City (TW)

MULTI-CHAMBER SEMICONDUCTOR PROCESSING SYSTEM WITH TRANSFER ROBOT TEMPERATURE ADJUSTMENT - A simplified explanation of the abstract

• This abstract for appeared for US patent application number 17723372 Titled 'MULTI-CHAMBER SEMICONDUCTOR PROCESSING SYSTEM WITH TRANSFER ROBOT TEMPERATURE ADJUSTMENT'

Simplified Explanation

The abstract describes a multi-chamber semiconductor processing system. This system consists of multiple chambers, each dedicated to a specific semiconductor process. There is also a transfer chamber and a transfer robot within it. The transfer robot has a holding member that can hold a wafer and is responsible for transferring the wafer between the different chambers. The transfer robot is equipped with a temperature sensor to detect its own temperature, and there is a temperature adjustment unit on the robot to regulate its temperature.

Original Abstract Submitted

A multi-chamber semiconductor processing system is provided. The multi-chamber semiconductor processing system includes: a plurality of chambers, each of the plurality of chambers corresponding to a semiconductor process; a transfer chamber; a transfer robot in the transfer chamber and having a holding member capable of holding a wafer, the transfer robot configured to transfer the wafer among the plurality of chambers; a first temperature sensor mounted on the holding member and configured to detect a transfer robot temperature; and a temperature adjustment unit mounted on the transfer robot and configured to adjust the transfer robot temperature.