US Patent Application 17714797. SEMICONDUCTOR DEVICE HAVING L-SHAPED CONDUCTIVE PATTERN simplified abstract

From WikiPatents
Jump to navigation Jump to search

SEMICONDUCTOR DEVICE HAVING L-SHAPED CONDUCTIVE PATTERN

Organization Name

Micron Technology, Inc.


Inventor(s)

Harunobu Kondo of Akita-shi (JP)


Kazuteru Ishizuka of Yokohama (JP)


Wataru Nobehara of Sagamihara (JP)


Ryosuke Yatsushiro of Tama (JP)


Makoto Saito of Akita-shi (JP)


SEMICONDUCTOR DEVICE HAVING L-SHAPED CONDUCTIVE PATTERN - A simplified explanation of the abstract

  • This abstract for appeared for US patent application number 17714797 Titled 'SEMICONDUCTOR DEVICE HAVING L-SHAPED CONDUCTIVE PATTERN'

Simplified Explanation

The abstract describes an apparatus that has a semiconductor substrate with a main surface. On this surface, there is a conductive pattern consisting of three sections. The first section extends in one direction, the second section extends in a different direction, and the third section connects the first and second sections. The third section has a slit that extends in a direction different from the first two sections.


Original Abstract Submitted

Disclosed herein is an apparatus that includes a semiconductor substrate having a main surface extending in a first direction and a second direction different from the first direction and a conductive pattern formed over the main surface of the semiconductor substrate. The conductive pattern includes a first section extending in the first direction, a second section extending in the second direction, and a third section connected between the first and second sections. The third section of the conductive pattern has a first slit extending in a third direction different from the first and second directions.