US Patent Application 17660169. SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION simplified abstract
Contents
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.
Inventor(s)
Chih Ping Liao of Hsinchu (TW)
Shih Hao Yang of Tainan City (TW)
Wei-Ming Wang of Hsinchu City (TW)
Chien Ting Lin of Hsinchu (TW)
Jie-Ying Yang of Yunlin County (TW)
Chih-Che Tang of Tainan City (TW)
Kuo Kang Teng of Tainan City (TW)
Ming-Hui Yu of Taichung City (TW)
Ker-hsun Liao of Hsinchu City (TW)
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION - A simplified explanation of the abstract
- This abstract for appeared for US patent application number 17660169 Titled 'SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION'
Simplified Explanation
The abstract describes techniques and apparatuses for preventing an injector nozzle from colliding with the interior wall of a thin-film furnace. This is achieved by using a fixture that is attached to the injector nozzle and can be adjusted to maintain a gap between the nozzle and the wall. This prevents any collision that could dislodge particles and contaminate semiconductor products made in the furnace.
Original Abstract Submitted
Some implementations described herein provide techniques and apparatuses for overcoming forces that may deflect an injector nozzle into an interior wall of a thin-film furnace. The implementations include a fixture that is coupled to the injector nozzle. The fixture is configurable to lock to a selected property of the injector nozzle to maintain, between a portion of the injector nozzle and the interior wall, a gap. In this way, the portion of the injector nozzle is prevented from colliding with the interior wall and dislodging particulates that may contaminate semiconductor product fabricated using the thin-film furnace.
