US Patent Application 17438172. Measurement Gap Configuration with Multiple Carriers simplified abstract

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Measurement Gap Configuration with Multiple Carriers

Organization Name

Apple Inc.


Inventor(s)

Qiming Li of Beijing (CN)


Dawei Zhang of Saratoga CA (US)


Jie Cui of San Jose CA (US)


Yang Tang of San Jose CA (US)


Manasa Raghavan of Sunnyvale CA (US)


Huaning Niu of San Jose CA (US)


Xiang Chen of Campbell CA (US)


Measurement Gap Configuration with Multiple Carriers - A simplified explanation of the abstract

  • This abstract for appeared for US patent application number 17438172 Titled 'Measurement Gap Configuration with Multiple Carriers'

Simplified Explanation

This abstract describes a technology related to measuring the configuration of gaps in a cellular network. The network establishes communication with a user equipment (UE) using two different cells. The network configures different bandwidth parts for each cell. A measurement gap configuration is provided to the UE, specifying when it should use a certain measurement gap pattern. At different times, the network communicates with the UE using different bandwidth parts and modifies the measurement gap pattern accordingly.


Original Abstract Submitted

Aspects are presented herein of apparatuses, systems, and methods for measurement gap configuration. A cellular network may establish communication with a UE using a first and second cell. The cellular network may configure bandwidth parts (BWPs) for the first and second cell, including a first and second BWP for the first cell and a third and fourth BWP for the second cell. A measurement gap configuration that specifies when the UE is to use a first measurement gap pattern may be provided to the UE. At a first time, the cellular network may communicate with the UE using the first BWP for the first cell and the third BWP for the second cell, based on the first measurement gap pattern. At a second time, the cellular network may communicate with the UE using the second BWP for the first cell based on a modification of the first measurement gap pattern.