Taiwan semiconductor manufacturing company, ltd. (20240134266). EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF simplified abstract
Contents
- 1 EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Yun-Yue Lin of Hsinchu City (TW)
EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240134266 titled 'EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF
Simplified Explanation
A reflective mask includes a substrate, a reflective multilayer, a capping layer, an intermediate layer, an absorber layer, and a cover layer. The absorber layer contains materials such as Jr, Pt, or Ru based materials.
- The reflective mask consists of multiple layers stacked on top of each other.
- The absorber layer is made up of Jr, Pt, or Ru based materials.
- The purpose of the mask is to reflect light and absorb unwanted radiation.
Potential Applications
The technology could be used in:
- Semiconductor manufacturing
- Photolithography processes
- Optical coatings
Problems Solved
This technology helps to:
- Improve precision in manufacturing processes
- Enhance optical performance
- Reduce unwanted reflections
Benefits
The benefits of this technology include:
- Increased efficiency in manufacturing
- Enhanced quality of optical components
- Improved performance in various applications
Potential Commercial Applications
The technology could be applied in:
- Semiconductor industry for producing microchips
- Optics industry for manufacturing lenses and mirrors
- Aerospace industry for developing high-performance optical systems
Possible Prior Art
Prior art may include:
- Reflective masks with different layer compositions
- Absorber layers made of various materials
Unanswered Questions
How does the absorber layer affect the overall performance of the reflective mask?
The article does not delve into the specific impact of the absorber layer on the mask's functionality and efficiency.
Are there any alternative materials that could be used for the absorber layer in reflective masks?
The article does not explore other potential materials that could be utilized in place of Jr, Pt, or Ru based materials for the absorber layer.
Original Abstract Submitted
a reflective mask includes a substrate, a reflective multilayer disposed over the substrate, a capping layer disposed over the reflective multilayer, an intermediate layer disposed over the capping layer, an absorber layer disposed over the intermediate layer, and a cover layer disposed over the absorber layer. the absorber layer includes one or more layers of an jr based material, a pt based material or a ru based material.
