Taiwan semiconductor manufacturing company, ltd. (20240112842). INDUCTOR AND METHOD OF FORMING THE SAME simplified abstract

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INDUCTOR AND METHOD OF FORMING THE SAME

Organization Name

taiwan semiconductor manufacturing company, ltd.

Inventor(s)

Po-Sheng Lu of Hsinchu City (TW)

Chien-Hung Liu of Hsinchu County (TW)

Nuo Xu of San Jose CA (US)

INDUCTOR AND METHOD OF FORMING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240112842 titled 'INDUCTOR AND METHOD OF FORMING THE SAME

Simplified Explanation

The abstract describes an inductor with a patterned wire structure consisting of a conductive core, a dielectric film, and a magnetic shell.

  • The inductor includes a patterned wire structure.
  • The patterned wire structure consists of a conductive core, a dielectric film, and a magnetic shell.
  • The conductive core has a pair of end surfaces and an outer surface between them.
  • The dielectric film covers the outer surface of the conductive core.
  • The magnetic shell covers the dielectric film, with the dielectric film sandwiched between the conductive core and the magnetic shell.

Potential Applications

This technology could be used in various electronic devices that require inductors, such as power supplies, filters, and RF circuits.

Problems Solved

This innovation solves the problem of efficiently integrating a dielectric film into an inductor design, providing improved performance and reliability.

Benefits

The benefits of this technology include enhanced inductor performance, increased efficiency, and improved reliability due to the optimized structure.

Potential Commercial Applications

Potential commercial applications of this technology include consumer electronics, telecommunications equipment, and automotive electronics.

Possible Prior Art

One possible prior art for this technology could be traditional inductor designs that do not incorporate a dielectric film in the structure.

Unanswered Questions

How does this technology compare to traditional inductor designs without a dielectric film?

This article does not provide a direct comparison between this technology and traditional inductor designs without a dielectric film. Further research or testing may be needed to evaluate the performance differences between the two.

What specific electronic devices could benefit the most from this technology?

The article does not specify the specific electronic devices that could benefit the most from this technology. Additional research or case studies may be required to determine the ideal applications for this innovation.


Original Abstract Submitted

an inductor and a method of forming the same are provided. the inductor includes a patterned wire structure. the patterned wire structure includes a conductive core, a dielectric film and a magnetic shell. the conductive core includes a pair of end surfaces and an outer surface between the pair of end surfaces. the dielectric film covers the outer surface. the magnetic shell covers the dielectric film. the dielectric film is between the conductive core and the magnetic shell.