Taiwan semiconductor manufacturing co., ltd. (20240096383). MEMORY DEVICE simplified abstract
Contents
- 1 MEMORY DEVICE
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 MEMORY DEVICE - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
MEMORY DEVICE
Organization Name
taiwan semiconductor manufacturing co., ltd.
Inventor(s)
Jhon-Jhy Liaw of Zhudong Township (TW)
MEMORY DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240096383 titled 'MEMORY DEVICE
Simplified Explanation
The memory device described in the abstract includes two SRAM cells and a first metal layer. The first SRAM cell consists of two write-port pull-up transistors and two read-port transistors arranged in the y-direction, while the second SRAM cell consists of two write-port pull-up transistors and two read-port transistors also arranged in the y-direction. The first metal layer extends in the y-direction and is shared by both SRAM cells.
- The memory device includes two SRAM cells and a first metal layer.
- Each SRAM cell has write-port pull-up transistors and read-port transistors arranged in the y-direction.
- The first metal layer extends in the y-direction and is shared by both SRAM cells.
Potential Applications
The technology described in this patent application could be applied in:
- Computer memory systems
- Embedded systems
- Mobile devices
Problems Solved
This technology helps in:
- Improving memory access speed
- Reducing power consumption
- Enhancing memory density
Benefits
The benefits of this technology include:
- Faster data retrieval
- Lower energy consumption
- Increased memory capacity
Potential Commercial Applications
The potential commercial applications of this technology could be in:
- Semiconductor industry
- Consumer electronics
- Telecommunications
Possible Prior Art
One possible prior art for this technology could be:
- Previous SRAM memory designs
- Metal layer configurations in memory devices
Unanswered Questions
How does this technology compare to traditional SRAM memory designs?
This article does not provide a direct comparison between this technology and traditional SRAM memory designs.
What are the specific power consumption savings achieved by this innovation?
The article does not specify the exact power consumption savings achieved by this innovation.
Original Abstract Submitted
a memory device includes a first static random access memory (sram) cell, a second sram cell, and a first metal layer. the first sram cell includes a first write-port pull-up (pu) transistor and a second write-port pu transistor arranged in a y-direction, and a first read-port pd transistor and a first read-port pg transistor. the second sram cell includes a third write-port pu transistor and a fourth write-port pu transistor arranged in the y-direction, and a second read-port pd transistor and a second read-port pg transistor. the first and second read-port pd transistors and the first and second read-port pg transistors are arranged in the y-direction. the first metal layer is over the first sram cell and the second sram cell. the first metal layer includes a read bit-line conductor extending in the y-direction and shared by the first sram cell and the second sram cell.