Taiwan semiconductor manufacturing co., ltd. (20240095433). ARRANGEMENT OF SOURCE OR DRAIN CONDUCTORS OF TRANSISTOR simplified abstract

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ARRANGEMENT OF SOURCE OR DRAIN CONDUCTORS OF TRANSISTOR

Organization Name

taiwan semiconductor manufacturing co., ltd.

Inventor(s)

Chih-Yu Lai of Hsinchu (TW)

Chih-Liang Chen of Hsinchu (TW)

Chi-Yu Lu of Hsinchu (TW)

Shang-Hsuan Chiu of Hsinchu (TW)

ARRANGEMENT OF SOURCE OR DRAIN CONDUCTORS OF TRANSISTOR - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240095433 titled 'ARRANGEMENT OF SOURCE OR DRAIN CONDUCTORS OF TRANSISTOR

Simplified Explanation

The integrated circuit described in the abstract includes two conductor segments separated by a separation distance, with each segment intersecting an active-region structure at a source/drain region. The positioning of the conductor segments relative to horizontal cell boundaries is optimized to improve performance.

  • The integrated circuit includes two conductor segments intersecting active-region structures at source/drain regions.
  • The conductor segments are separated by a specific distance.
  • The distance from each conductor segment to the nearest horizontal cell boundary is optimized for performance improvement.

Potential Applications

This technology could be applied in various electronic devices such as smartphones, tablets, and computers to enhance the efficiency and performance of integrated circuits.

Problems Solved

1. Improved performance of integrated circuits. 2. Optimization of conductor segment positioning for better functionality.

Benefits

1. Enhanced efficiency and performance of electronic devices. 2. Increased reliability of integrated circuits. 3. Potential cost savings in manufacturing processes.

Potential Commercial Applications

Optimizing conductor segment positioning in integrated circuits for improved performance in electronic devices.

Possible Prior Art

There may be prior art related to optimizing conductor segment positioning in integrated circuits for performance enhancement, but specific examples are not provided in this context.

Unanswered Questions

How does the separation distance between the conductor segments impact the overall performance of the integrated circuit?

The abstract mentions a separation distance between the conductor segments, but it does not elaborate on how this distance affects the functionality or efficiency of the integrated circuit.

Are there any specific design considerations for implementing this technology in different types of electronic devices?

It is not clear from the abstract whether there are specific design considerations or adaptations needed when applying this technology to various electronic devices.


Original Abstract Submitted

an integrated circuit includes a first conductor segment intersecting a first active-region structure at a source/drain region and a second conductor segment intersecting a second active-region structure at a source/drain region. the first conductor segment and the second conductor segment are separated at proximal edges by a separation distance. a distance from a first horizontal cell boundary to a proximal edge of the first conductor segment is larger than a distance from a second horizontal cell boundary to a proximal edge of the second conductor segment by a predetermined distance that is a fraction of the separation distance.