TOKYO ELECTRON LIMITED patent applications published on March 21st, 2024

Summary of the patent applications from TOKYO ELECTRON LIMITED on March 21st, 2024

Recently, TOKYO ELECTRON LIMITED has filed patents for innovative technologies in the fields of bonding apparatus, semiconductor manufacturing, and etching control systems. These patents aim to improve the efficiency, precision, and control of various manufacturing processes.

Summary: - The bonding apparatus patent describes a control system that adjusts attracting pressure distribution to ensure successful bonding of substrates. - The semiconductor manufacturing patent involves vertically spaced semiconductor channels with gate structures for improved device performance. - The etching control system patent optimizes the relationship between etching amount distribution and process parameters for precise control over multiple nozzles.

Notable Applications:

• Semiconductor manufacturing
• Microelectronics assembly
• Medical device production
• Printed circuit board production
• Electronics manufacturing

These patents offer solutions to common issues in manufacturing processes and have the potential to enhance product quality, increase efficiency, and enable customization for different substrates.

Patent applications for TOKYO ELECTRON LIMITED on March 21st, 2024

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD (18255407)

Main Inventor

Yuichi FURUYA

LIQUID RAW MATERIAL SUPPLYING METHOD AND GAS SUPPLY APPARATUS (18244532)

Main Inventor

Hiroaki DEWA

Optical Emission Spectroscopy for Advanced Process Characterization (17948407)

Main Inventor

Sergey Voronin

SUBSTRATE TREATMENT APPARATUS AND TREATMENT SOLUTION SUPPLY METHOD (18465420)

Main Inventor

Makoto OGATA

SUBSTRATE PROCESSING APPARATUS (18526350)

Main Inventor

Kouichi Mizunaga

FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING (18524767)

Main Inventor

Kazuhide HASEBE

Substrate Bombardment with Ions having Targeted Mass using Pulsed Bias Phase Control (17945408)

Main Inventor

Sergey Voronin

PLASMA MONITORING SYSTEM, PLASMA MONITORING METHOD, AND MONITORING DEVICE (18515220)

Main Inventor

Satoru TERUUCHI

Method and Apparatus for In-Situ Dry Development (17950001)

Main Inventor

Steven Grzeskowiak

METHODS TO PREVENT SURFACE CHARGE INDUCED CD-DEPENDENT ETCHING OF MATERIAL FORMED WITHIN FEATURES ON A PATTERNED SUBSTRATE (17946609)

Main Inventor

Shan Hu

SURFACE MODIFICATION TO ACHIEVE SELECTIVE ISOTROPIC ETCH (17945897)

Main Inventor

Jonathan HOLLIN

High Aspect Ratio Contact (HARC) Etch (17948768)

Main Inventor

Pingshan Luan

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD (18367742)

Main Inventor

Shogo FUKUI

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS (18519519)

Main Inventor

Fumihiro KAMIMURA

ETCHING CONTROL SYSTEM AND ETCHING CONTROL METHOD (18468928)

Main Inventor

Toyohisa Tsuruda

ETCHING CONTROL SYSTEM AND ETCHING CONTROL METHOD (18468966)

Main Inventor

Toyohisa Tsuruda

ETCHING CONTROL DEVICE, ETCHING CONTROL METHOD, AND ETCHING CONTROL SYSTEM (18469673)

Main Inventor

Toyohisa Tsuruda

HIGH PERFORMANCE 3D COMPACT TRANSISTOR ARCHITECTURE (17945888)

Main Inventor

H. Jim Fulford

BONDING APPARATUS AND BONDING METHOD (18467071)

Main Inventor

Hideyuki Fukushima