Samsung electronics co., ltd. (20240134775). METHOD AND DEVICE FOR FINDING CAUSALITY BETWEEN APPLICATION INSTRUMENTATION POINTS simplified abstract

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METHOD AND DEVICE FOR FINDING CAUSALITY BETWEEN APPLICATION INSTRUMENTATION POINTS

Organization Name

samsung electronics co., ltd.

Inventor(s)

Jae-Eon Jo of Suwon-si (KR)

Rohyoung Myung of Suwon-si (KR)

Hans Gustav Åhlman of Suwon-si (KR)

METHOD AND DEVICE FOR FINDING CAUSALITY BETWEEN APPLICATION INSTRUMENTATION POINTS - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240134775 titled 'METHOD AND DEVICE FOR FINDING CAUSALITY BETWEEN APPLICATION INSTRUMENTATION POINTS

Simplified Explanation

The patent application describes an electronic device that can measure the causal relationship between different tasks in an application running in parallel on one or more processors.

  • The device installs instrumentation points in tasks of an application, including a source instrumentation point in a source task and a target instrumentation point in a target task.
  • It determines the causal relationship between the source and target instrumentation points by observing delays induced by the source instrumentation point.

Potential Applications

This technology could be applied in various fields such as software development, performance optimization, and system analysis.

Problems Solved

This technology helps in identifying and measuring causal relationships between different tasks in parallel processing, which can aid in debugging, performance tuning, and system optimization.

Benefits

The benefits of this technology include improved system performance, enhanced debugging capabilities, and better understanding of task interactions in parallel processing environments.

Potential Commercial Applications

Potential commercial applications of this technology include software development tools, performance monitoring systems, and cloud computing platforms.

Possible Prior Art

One possible prior art could be existing tools or methods used for performance profiling and analysis in parallel processing systems.

What are the specific tasks or applications where this technology can be most beneficial?

This technology can be most beneficial in applications where parallel processing is crucial, such as high-performance computing, real-time systems, and distributed computing.

How does this technology compare to existing methods for measuring causal relationships between tasks in parallel processing systems?

Existing methods for measuring causal relationships may rely on manual analysis or limited instrumentation points, whereas this technology automates the process and provides a more comprehensive approach to measuring causal relationships between tasks.


Original Abstract Submitted

an electronic device includes: one or more processors; a memory storing instructions configured to cause the one or more processors to: install instrumentation points in respective tasks of an application, the instrumentation points including a source instrumentation point installed in a source task and a target instrumentation point installed in a target task, wherein the source task and the target task are configured to execute in parallel on the one or more processors, and wherein each task includes a respective sequence of instructions executable by the one or more processors, and determine a measure of a causal relationship between the source instrumentation point and the target instrumentation point based on observation of a delay in the target instrumentation point induced by a delay amount generated by the source instrumentation point.