Samsung electronics co., ltd. (20240121941). SEMICONDUCTOR DEVICE simplified abstract

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SEMICONDUCTOR DEVICE

Organization Name

samsung electronics co., ltd.

Inventor(s)

Jaecheon Yong of Suwon-si (KR)

Daehong Ko of Seoul (KR)

SEMICONDUCTOR DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240121941 titled 'SEMICONDUCTOR DEVICE

Simplified Explanation

The semiconductor device described in the abstract includes a substrate with semiconductor patterns, gate patterns, and a landing pattern. The landing pattern is connected to the gate patterns and includes a semiconductor material layer and a conductive material layer.

  • Semiconductor device with substrate, semiconductor patterns, gate patterns, and landing pattern:
   * The device has a substrate with distinct regions.
   * Semiconductor patterns are arranged on the substrate in a specific direction.
   * Gate patterns surround the semiconductor patterns.
   * A landing pattern is present on a different region of the substrate and is electrically connected to the gate patterns.
   * The landing pattern consists of a semiconductor material layer and a conductive material layer.

Potential Applications

The technology described in this patent application could be applied in: - Semiconductor manufacturing - Integrated circuit design - Electronics industry

Problems Solved

This technology helps in: - Improving the efficiency of semiconductor devices - Enhancing the performance of integrated circuits - Facilitating electrical connections in electronic components

Benefits

The benefits of this technology include: - Increased functionality of semiconductor devices - Enhanced electrical connectivity - Improved overall performance of electronic systems

Potential Commercial Applications

The potential commercial applications of this technology could be in: - Semiconductor companies - Electronics manufacturers - Research and development firms

Possible Prior Art

One possible prior art related to this technology could be: - Previous patents or publications on semiconductor device structures - Research papers on gate patterns and semiconductor materials

Unanswered Questions

How does this technology impact the cost of semiconductor manufacturing?

The abstract does not provide information on the cost implications of implementing this technology in semiconductor manufacturing processes.

What are the environmental considerations of using this technology?

The abstract does not address any environmental aspects or sustainability factors associated with the production and use of semiconductor devices incorporating this technology.


Original Abstract Submitted

a semiconductor device includes a substrate having first and second regions, semiconductor patterns spaced apart from each other in a first horizontal direction on the first region, wherein each of the semiconductor patterns has first side surfaces opposing each other in the first horizontal direction and second side surfaces opposing each other in a second horizontal direction, the first and second horizontal directions parallel to an upper surface of the substrate, the second horizontal direction perpendicular to the first horizontal direction, gate patterns surrounding an upper surface, a lower surface, and the first side surfaces of each of the semiconductor patterns, and a landing pattern spaced apart from the semiconductor patterns in the first horizontal direction on the second region and electrically connected to the gate patterns. the landing pattern includes a semiconductor material layer and a conductive material layer covering at least one surface of the semiconductor material layer.