Samsung electronics co., ltd. (20240107743). SEMICONDUCTOR DEVICE simplified abstract

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SEMICONDUCTOR DEVICE

Organization Name

samsung electronics co., ltd.

Inventor(s)

JUNHYEOK Ahn of SUWON-SI (KR)

KISEOK Lee of SUWON-SI (KR)

SEMICONDUCTOR DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240107743 titled 'SEMICONDUCTOR DEVICE

Simplified Explanation

The semiconductor device described in the abstract includes a substrate with an active region consisting of a first region and a second region, a bitline connected to the first region, a spacer structure on the side surface of the bitline, a contact structure on the side surface of the spacer structure connected to the second region, and a data storage structure on the contact structure.

  • The semiconductor device has a unique contact structure with a conductive contact layer, a barrier layer, and an air gap.
  • The contact structure provides electrical connection to the second region of the active region.

Potential Applications

The technology described in the patent application could be applied in:

  • Memory devices
  • Semiconductor manufacturing

Problems Solved

This technology helps in:

  • Improving data storage efficiency
  • Enhancing semiconductor device performance

Benefits

The benefits of this technology include:

  • Increased data storage capacity
  • Enhanced electrical connectivity
  • Improved overall device functionality

Potential Commercial Applications

The technology could be utilized in:

  • Consumer electronics
  • Data storage devices

Possible Prior Art

One possible prior art for this technology could be:

  • Semiconductor devices with similar contact structures

Unanswered Questions

How does this technology compare to existing semiconductor devices in terms of performance and efficiency?

The article does not provide a direct comparison between this technology and existing semiconductor devices.

What are the specific manufacturing processes involved in creating the unique contact structure described in the patent application?

The article does not detail the specific manufacturing processes involved in creating the contact structure.


Original Abstract Submitted

a semiconductor device includes; a substrate including an active region including a first region and a second region, a bitline extending in a first direction on the substrate and electrically connected to the first region of the active region, a spacer structure disposed on a side surface of the bitline, a contact structure disposed on a side surface of the spacer structure and electrically connected to the second region of the active region and a data storage structure disposed on the contact structure and electrically connected to the contact structure. the contact structure includes; a conductive contact layer including a first portion and a second portion disposed on the first portion, a barrier layer surrounding the first portion of the conductive contact layer, and an air gap surrounding the second portion of the conductive contact layer.