Samsung display co., ltd. (20240112911). LASER CRYSTALLIZATION APPARATUS AND LASER CRYSTALLIZATION METHOD simplified abstract
Contents
- 1 LASER CRYSTALLIZATION APPARATUS AND LASER CRYSTALLIZATION METHOD
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 LASER CRYSTALLIZATION APPARATUS AND LASER CRYSTALLIZATION METHOD - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
LASER CRYSTALLIZATION APPARATUS AND LASER CRYSTALLIZATION METHOD
Organization Name
Inventor(s)
Dongchan Seo of Yongin-si (KR)
Younghoon Oh of Yongin-si (KR)
LASER CRYSTALLIZATION APPARATUS AND LASER CRYSTALLIZATION METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240112911 titled 'LASER CRYSTALLIZATION APPARATUS AND LASER CRYSTALLIZATION METHOD
Simplified Explanation
The laser crystallization apparatus described in the patent application includes multiple laser generators, an optical system, a process chamber, monitoring devices, and a controller. The controller controls the oscillation times of the laser generators to optimize the synthesized pulse of the incident laser beam for crystallizing thin films on substrates.
- Laser crystallization apparatus components:
- Multiple laser generators - Optical system - Process chamber - Monitoring devices - Controller
- Controller function:
- Controls oscillation times of laser generators - Generates synthesized pulses from incident laser beam - Derives optimal synthesized pulse for crystallization
Potential Applications
The technology can be used in the manufacturing of electronic devices, such as displays, sensors, and integrated circuits, where precise crystallization of thin films is required.
Problems Solved
The apparatus solves the problem of achieving uniform and controlled crystallization of thin films on substrates, which is essential for the production of high-quality electronic components.
Benefits
- Improved efficiency in thin film crystallization process - Enhanced quality and performance of electronic devices - Precise control over crystallization parameters
Potential Commercial Applications
"Advanced Laser Crystallization Technology for Electronic Manufacturing"
Possible Prior Art
Prior art may include similar laser crystallization apparatus used in the semiconductor industry for thin film processing.
Unanswered Questions
How does the apparatus handle variations in substrate materials and thicknesses during the crystallization process?
The patent application does not provide specific details on how the apparatus adjusts for different substrate materials and thicknesses to ensure consistent crystallization results.
What safety measures are in place to protect operators and prevent accidents during operation?
The patent application does not mention any safety features or protocols that are implemented to safeguard operators and prevent potential accidents while using the laser crystallization apparatus.
Original Abstract Submitted
a laser crystallization apparatus includes: a plurality of laser generators which generates an incident laser beam; an optical system which optically converts the incident laser beam to an output laser beam; a process chamber in which a thin film formed on a substrate is crystallized by the output laser beam radiated thereto; a first monitoring device which detects a synthesized pulse of the output laser beam; a second monitoring device which detects individual pulses of the incident laser beam; and a controller which controls oscillation times of the plurality of laser generators. the controller generates a plurality of synthesized pulses by combining the individual pulses of the incident laser beam, and derives an optimal synthesized pulse from the plurality of synthesized pulses.
