Samsung display co., ltd. (20240107868). METHOD OF MANUFACTURING DISPLAY DEVICE simplified abstract
Contents
METHOD OF MANUFACTURING DISPLAY DEVICE
Organization Name
Inventor(s)
JONGHOON Choi of Yongin-si (KR)
HIROSHI Okumura of Yongin-si (KR)
METHOD OF MANUFACTURING DISPLAY DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240107868 titled 'METHOD OF MANUFACTURING DISPLAY DEVICE
Simplified Explanation
The method described in the patent application involves manufacturing a display device by forming multiple layers of silicon on a substrate. Here are the key points of the innovation:
- Forming a first amorphous silicon layer on a substrate with defined areas.
- Placing a mask on a portion of the first amorphous silicon layer.
- Adding a preliminary second amorphous silicon layer on top of the first layer and the mask.
- Creating a second amorphous silicon layer by removing part of the preliminary layer using the mask as a guide.
- Removing the mask.
- Crystallizing the first and second amorphous silicon layers to form a polycrystalline silicon layer.
Potential Applications: - This technology can be used in the manufacturing of high-resolution displays for electronic devices such as smartphones, tablets, and televisions.
Problems Solved: - The method provides a way to efficiently produce polycrystalline silicon layers for display devices, which is crucial for achieving high image quality and resolution.
Benefits: - Improved display quality and resolution. - Cost-effective manufacturing process.
Potential Commercial Applications: - "Innovative Method for Manufacturing High-Resolution Display Devices"
Possible Prior Art: - Prior methods of manufacturing display devices may have involved different techniques for forming polycrystalline silicon layers, but this specific combination of steps may be unique to this patent application.
Unanswered Questions: 1. How does the crystallization process affect the overall performance of the display device? 2. Are there any specific limitations or challenges associated with implementing this manufacturing method on a large scale?
Original Abstract Submitted
a method of manufacturing a display device includes forming a first amorphous silicon layer on a substrate on which a first area and a second area are defined, forming a mask in the second area on the first amorphous silicon layer, forming a preliminary second amorphous silicon layer on the first amorphous silicon layer and the mask, forming a second amorphous silicon layer by removing a portion of the preliminary second amorphous silicon layer on the mask, removing the mask, and forming a polycrystalline silicon layer by crystallizing the first amorphous silicon layer and the second amorphous silicon layer.
