Samsung display co., ltd. (20240107866). MASK FOR DEPOSITION simplified abstract
Contents
- 1 MASK FOR DEPOSITION
MASK FOR DEPOSITION
Organization Name
Inventor(s)
MASK FOR DEPOSITION - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240107866 titled 'MASK FOR DEPOSITION
Simplified Explanation
The embodiment described in the abstract is a deposition mask with asymmetrical opening areas and dummy openings on each side. The first and second dummy openings are symmetrical with respect to a second direction intersecting the first direction.
- Opening area with an opening
- First dummy opening area with a first dummy opening
- Second dummy opening area with a second dummy opening
- Asymmetrical first and second sides of the opening
- Symmetrical first and second dummy openings with respect to the second direction
Potential Applications
This technology could be used in semiconductor manufacturing processes where precise deposition of materials is required.
Problems Solved
This technology solves the problem of ensuring uniform deposition of materials on a substrate by providing a mask with symmetrical dummy openings.
Benefits
The benefits of this technology include improved accuracy and consistency in deposition processes, leading to higher quality end products.
Potential Commercial Applications
One potential commercial application of this technology is in the production of microchips and other electronic components where precise material deposition is critical.
Possible Prior Art
One possible prior art could be the use of deposition masks with symmetrical features to improve material deposition processes.
What are the specific materials used in this technology?
The specific materials used in this technology are not mentioned in the abstract. Further details would be needed to determine the materials used in the deposition mask.
How does this technology compare to existing deposition mask designs?
The abstract does not provide a comparison to existing deposition mask designs. Additional information would be required to assess the differences and advantages of this technology over existing designs.
Original Abstract Submitted
an embodiment provides a deposition mask including an opening area including an opening; a first dummy opening area disposed at a first side of the opening area in a first direction and having a first dummy opening in the first dummy opening area; and a second dummy opening area disposed at a second side of the opening area in the first direction and having a second dummy opening in the second dummy opening area. a first side and a second side of the opening are asymmetrical with respect to a second direction intersecting the first direction, and the first dummy opening and the second dummy opening are symmetrical with the opening with respect to the second direction.
