Samsung display co., ltd. (20240102942). DEFECT ANALYSIS DEVICE AND DEFECT ANALYSIS METHOD USING THE SAME simplified abstract
Contents
- 1 DEFECT ANALYSIS DEVICE AND DEFECT ANALYSIS METHOD USING THE SAME
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 DEFECT ANALYSIS DEVICE AND DEFECT ANALYSIS METHOD USING THE SAME - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
DEFECT ANALYSIS DEVICE AND DEFECT ANALYSIS METHOD USING THE SAME
Organization Name
Inventor(s)
YEON KEON Moon of Yongin-si (KR)
JUN HYUNG Lim of Yongin-si (KR)
DEFECT ANALYSIS DEVICE AND DEFECT ANALYSIS METHOD USING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240102942 titled 'DEFECT ANALYSIS DEVICE AND DEFECT ANALYSIS METHOD USING THE SAME
Simplified Explanation
The patent application describes a defect analysis device that uses a light source to irradiate an analysis target layer of an element, a position adjuster to adjust the position in the analysis target to be irradiated, a detector to measure the current value of current flowing between different areas of the element, and an analyzer to acquire quantitative data related to defects in the analysis target layer based on the current value.
- Light source irradiates analysis target layer with light
- Position adjuster adjusts position in analysis target to be irradiated
- Detector measures current flowing between different areas of the element
- Analyzer acquires quantitative data related to defects in the analysis target layer
Potential Applications
The technology can be used in semiconductor manufacturing to detect defects in thin films or layers.
Problems Solved
This technology helps in identifying defects in the analysis target layer, which can improve the quality control process in manufacturing.
Benefits
The device provides quantitative data on defects, allowing for more accurate and efficient defect analysis.
Potential Commercial Applications
One potential commercial application of this technology is in the semiconductor industry for quality control in thin film manufacturing processes.
Possible Prior Art
One possible prior art could be similar defect analysis devices used in the semiconductor industry.
Unanswered Questions
1. How does the device handle different types of defects in the analysis target layer? 2. Are there any limitations to the size or thickness of the analysis target layer that can be effectively analyzed by the device?
Original Abstract Submitted
provided is a defect analysis device which may include a light source that irradiates an analysis target layer of an element with light, a position adjuster that adjusts a position in the analysis target in the analysis target to be irradiated with the light, a detector that measures a current value of current flowing between a source area of the element electrically connected to one end of the analysis target layer and a drain area of the element electrically connected to the other end of the analysis target layer in the element, and an analyzer that acquires quantitative data related to a defect in the analysis target layer on the basis of the current value in which, in a first mode, a plurality of areas of the analysis target layer are sequentially irradiated with the light.
