Samsung display co., ltd. (20240102921). OPTICAL INSPECTION APPARATUS simplified abstract
Contents
- 1 OPTICAL INSPECTION APPARATUS
OPTICAL INSPECTION APPARATUS
Organization Name
Inventor(s)
Basrur Veidhes of Yongin-si (KR)
Dae Hyun Kim of Hwaseong-si (KR)
Jong Won Lee of Hwaseong-si (KR)
Joo Yeol Lee of Yongin-si (KR)
OPTICAL INSPECTION APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240102921 titled 'OPTICAL INSPECTION APPARATUS
Simplified Explanation
The optical inspection apparatus described in the patent application includes a stage for supporting a target substrate with light emitting elements, a jig with a regulation resistor for applying an electrical signal to the substrate, a microscope for generating magnified image data, a camera for capturing color images, and an optical measurement unit for generating spectrum images and measuring optical characteristics of the substrate.
- Stage supports target substrate with light emitting elements
- Jig applies electrical signal to substrate with regulation resistor
- Microscope generates magnified image data
- Camera captures color images of the substrate
- Optical measurement unit generates spectrum images and measures optical characteristics
Potential Applications
The technology described in this patent application could be applied in industries such as semiconductor manufacturing, quality control, and research and development where precise optical inspection of substrates is required.
Problems Solved
This technology solves the problem of efficiently and accurately inspecting target substrates with light emitting elements by combining magnified image data, color images, and spectrum images to measure optical characteristics.
Benefits
The benefits of this technology include improved accuracy in optical inspection, faster data collection and analysis, and the ability to detect and analyze optical characteristics of substrates with light emitting elements.
Potential Commercial Applications
- Semiconductor manufacturing quality control systems
- Research and development laboratories for optical analysis
- Electronics manufacturing for quality assurance in production processes
Possible Prior Art
One possible prior art for this technology could be optical inspection systems used in semiconductor manufacturing for quality control and defect detection.
Unanswered Questions
How does this technology compare to existing optical inspection systems in terms of accuracy and efficiency?
This article does not provide a direct comparison between this technology and existing optical inspection systems in terms of accuracy and efficiency.
What are the potential limitations or challenges in implementing this technology in different industries?
This article does not address the potential limitations or challenges in implementing this technology in different industries.
Original Abstract Submitted
an optical inspection apparatus includes a stage that supports a target substrate, the target substrate including a plurality of light emitting elements, a jig that applies an electrical signal to the target substrate, the jig including a regulation resistor, a microscope that generates magnified image data of the target substrate, a camera that captures the magnified image data to generate a color image of the target substrate, and an optical measurement unit that captures the magnified image data of the target substrate to generate a spectrum image and measure optical characteristics of the target substrate.
