Samsung display co., ltd. (20240096251). METHOD OF INSPECTING A PIXEL simplified abstract
Contents
- 1 METHOD OF INSPECTING A PIXEL
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 METHOD OF INSPECTING A PIXEL - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
METHOD OF INSPECTING A PIXEL
Organization Name
Inventor(s)
METHOD OF INSPECTING A PIXEL - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240096251 titled 'METHOD OF INSPECTING A PIXEL
Simplified Explanation
The method described in the abstract involves inspecting a pixel by measuring drain currents at different gate voltages and intervals, generating graphs based on these measurements, and determining defects in the transistor based on the graphs.
- Measuring first drain current with a first gate voltage and interval in a first voltage period
- Generating a first gate voltage-drain current graph based on the first drain current
- Measuring second drain current with a lower second gate voltage and different second voltage interval in a second voltage period
- Generating a second gate voltage-drain current graph based on the second drain current
- Determining defects in the transistor based on the graphs
Potential Applications
This technology can be applied in the semiconductor industry for quality control and defect detection in pixel inspection processes.
Problems Solved
This technology helps in identifying defects in transistors, which can improve the overall quality and performance of electronic devices.
Benefits
The method provides a systematic approach to inspecting pixels and identifying defects, leading to enhanced product reliability and performance.
Potential Commercial Applications
"Enhancing Pixel Inspection Process for Semiconductor Industry"
Possible Prior Art
There may be prior art related to transistor inspection methods in the semiconductor industry, but specific examples are not provided in the abstract.
Unanswered Questions
How does this method compare to traditional pixel inspection techniques?
Answer: This article does not provide a direct comparison to traditional pixel inspection techniques, leaving the reader to wonder about the advantages and limitations of this new method.
What are the specific types of defects that can be identified using this method?
Answer: The abstract mentions determining defects in the transistor, but it does not specify the exact types of defects that can be detected through this process.
Original Abstract Submitted
a method of inspecting a pixel includes measuring a first drain current by applying a first gate voltage with a first voltage interval to a gate terminal of a transistor included in a test pattern in a first voltage period, generating a first gate voltage-drain current graph based on the first drain current, measuring a second drain current by applying a second gate voltage which is lower than the first gate voltage with a second voltage interval which is different from the first voltage interval to the gate terminal of the transistor in a second voltage period which is different from the first voltage period, generating a second gate voltage-drain current graph based on the second drain current, and determining a defect of the transistor based on the first gate voltage-drain current graph and the second gate voltage-drain current graph.
