Samsung display co., ltd. (20240093369). DEPOSITION APPARATUS simplified abstract
Contents
- 1 DEPOSITION APPARATUS
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 DEPOSITION APPARATUS - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
DEPOSITION APPARATUS
Organization Name
Inventor(s)
DEPOSITION APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240093369 titled 'DEPOSITION APPARATUS
Simplified Explanation
The deposition apparatus described in the abstract includes a chamber with a gate for loading and unloading substrates, and a susceptor with hot-wires arranged asymmetrically for independent control.
- The deposition apparatus includes a chamber with a gate for substrate loading and unloading.
- The susceptor in the chamber has hot-wires arranged asymmetrically for independent control.
Potential Applications
This technology could be used in semiconductor manufacturing processes, thin film deposition, and other industries requiring precise control over substrate heating and deposition.
Problems Solved
This technology solves the problem of achieving uniform and controlled substrate heating during deposition processes, leading to improved film quality and consistency.
Benefits
The benefits of this technology include enhanced deposition control, improved film quality, increased process efficiency, and reduced production costs.
Potential Commercial Applications
Potential commercial applications of this technology include semiconductor fabrication, solar cell production, display manufacturing, and other industries requiring thin film deposition processes.
Possible Prior Art
One possible prior art for this technology could be the use of traditional susceptor designs with symmetrically arranged heating elements, limiting independent control and uniformity in substrate heating.
Unanswered Questions
How does the asymmetrical arrangement of hot-wires improve deposition processes compared to symmetrical designs?
The asymmetrical arrangement of hot-wires allows for more precise control over substrate heating in different regions, potentially leading to improved film quality and deposition uniformity.
What are the specific parameters that can be controlled independently for each hot-wire in the susceptor?
The specific parameters that can be controlled independently for each hot-wire may include temperature, power input, and heating profile, allowing for customized substrate heating profiles during deposition processes.
Original Abstract Submitted
a deposition apparatus includes a chamber providing an inner space, a gate disposed on one side of the chamber and opening and closing the chamber to allow a substrate to be loaded and unloaded therethrough, and a susceptor including one surface on which the substrate is seated. the susceptor includes a susceptor body including a first region and a second region disposed in a first direction farther away from the gate than the first region, a first hot-wire arranged in a first pattern in the first region, and a second hot-wire arranged in a second pattern in the first and second regions. the first and second hot-wires is asymmetric with respect to a second direction crossing the center of the susceptor body in a plan view and orthogonal to the first direction, and the first and second hot-wires may be controlled independently.
