PELLICLE FRAME WITH STRESS RELIEF TRENCHES: abstract simplified (18335232)

• This abstract for appeared for patent application number 18335232 Titled 'PELLICLE FRAME WITH STRESS RELIEF TRENCHES'

Simplified Explanation

The abstract describes a method of reducing damage to a pellicle in a photomask assembly. Stress relief trenches are created in the pellicle frame to allow it to deform along with the pellicle, thus minimizing damage to the pellicle caused by the frame.

Original Abstract Submitted

A photomask assembly may be formed such that stress relief trenches are formed in a pellicle frame of the photomask assembly. The stress relief trenches may reduce or prevent damage to a pellicle that may otherwise result from deformation of the pellicle. The stress relief trenches may be formed in areas of the pellicle frame to allow the pellicle frame to deform with the pellicle, thereby reducing the amount damage to the pellicle caused by the pellicle frame.