Nec corporation (20240094391). DEVICE, METHOD, AND PROGRAM FOR DETECTING ABNORMAL POSITION simplified abstract

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DEVICE, METHOD, AND PROGRAM FOR DETECTING ABNORMAL POSITION

Organization Name

nec corporation

Inventor(s)

Jiro Abe of Tokyo (JP)

DEVICE, METHOD, AND PROGRAM FOR DETECTING ABNORMAL POSITION - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240094391 titled 'DEVICE, METHOD, AND PROGRAM FOR DETECTING ABNORMAL POSITION

Simplified Explanation

The technique described in the patent application involves a device that can identify abnormal changes in a surface or region of a subject by analyzing reflection signals generated in response to emitted signals from a distance measuring device.

  • The device includes at least one processor that can:
 * Extract parts of the subject's surface with abnormal changes based on reflection signals from different emitting sections of the distance measuring device.
 * Specify a region of the surface that includes the extracted parts from multiple emitting sections.

Potential Applications

This technology could be used in various fields such as medical imaging, industrial inspections, and quality control processes where identifying abnormal changes in surfaces is crucial.

Problems Solved

This technology helps in quickly identifying abnormal changes in surfaces or regions, which can be challenging to detect visually or through traditional methods.

Benefits

The benefits of this technology include:

  • Early detection of abnormalities in surfaces
  • Improved accuracy in identifying problematic areas
  • Efficient and automated analysis of surface changes

Potential Commercial Applications

A potential commercial application for this technology could be in the development of advanced medical imaging devices for detecting abnormalities in tissues or organs.

Possible Prior Art

One possible prior art for this technology could be the use of similar techniques in the field of remote sensing for identifying changes in land surfaces over time.

Unanswered Questions

How does this technology compare to existing methods for surface analysis?

This article does not provide a direct comparison between this technology and other existing methods for surface analysis. It would be helpful to understand the specific advantages and limitations of this technique in comparison to traditional approaches.

What are the potential limitations or challenges in implementing this technology in real-world applications?

The article does not address any potential limitations or challenges that may arise when implementing this technology in practical settings. It would be important to consider factors such as cost, scalability, and compatibility with existing systems.


Original Abstract Submitted

provided is a technique that specifies (a) a part actually having an abnormal change in surface or (b) a region including the part. the device includes at least one processor configured to: extract, on the basis of a reflection signal generated in response to a signal that one of a plurality of emitting sections included in a distance measuring device has emitted to a subject, a part of a surface of the subject which part has an abnormal change, the extracting being carried out for each of the plurality of emitting sections; and specify a region of the surface, the region including parts of the surface which parts have been extracted in relation to two or more of the plurality of emitting sections.