Kioxia corporation (20240096669). SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract
Contents
- 1 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
Organization Name
Inventor(s)
Fumiki Aiso of Nagoya Aichi (JP)
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240096669 titled 'SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
Simplified Explanation
The substrate processing apparatus described in the abstract includes a boat for holding multiple substrates, a reactor for processing the substrates, and arms for transferring the substrates between different components of the apparatus.
- The boat can accommodate multiple substrates arranged in a specific direction.
- The first arm transfers individual substrates between a storage container and the second arm.
- The second arm can hold and transfer two substrates at a time between the first arm and the boat.
Potential Applications
The technology described in this patent application could be used in semiconductor manufacturing, solar panel production, and other industries that require precise processing of substrates.
Problems Solved
This technology solves the problem of efficiently transferring and processing multiple substrates in a controlled environment, reducing the risk of damage or contamination.
Benefits
The benefits of this technology include increased productivity, improved substrate handling, and enhanced processing capabilities for various applications.
Potential Commercial Applications
Potential commercial applications for this technology include semiconductor fabrication facilities, research laboratories, and manufacturing plants that require high-throughput substrate processing equipment.
Possible Prior Art
One possible prior art for this technology could be automated substrate handling systems used in semiconductor manufacturing facilities.
Unanswered Questions
How does this technology improve substrate processing efficiency?
This technology improves substrate processing efficiency by allowing for the simultaneous handling of multiple substrates and precise transfer between different components of the apparatus.
What are the potential cost savings associated with this technology?
The potential cost savings associated with this technology include reduced labor costs, increased throughput, and improved yield rates due to more controlled substrate processing.
Original Abstract Submitted
a substrate processing apparatus according to an embodiment includes a boat capable of accommodating a plurality of substrates taken out from a storage container, a reactor capable of housing the boat and processing the plurality of substrates, and first and second arms that transfer the plurality of substrates. the boat accommodates the substrates in a first direction intersecting surfaces of the substrates. the first arm holds both ends of one substrate in a second direction intersecting the first direction, and is capable of transferring the one substrate between the storage container and the second arm. the second arm has a first holder that can support two substrates in a third direction intersecting the first and second directions, and is capable of transferring the two substrates between the first arm and the boat.
