International business machines corporation (20240136287). Local VDD And VSS Power Supply Through Dummy Gates with Gate Tie-Downs and Associated Benefits simplified abstract

Local VDD And VSS Power Supply Through Dummy Gates with Gate Tie-Downs and Associated Benefits

Organization Name

international business machines corporation

Inventor(s)

Ruilong Xie of Niskayuna NY (US)

Nicholas Anthony Lanzillo of Wynantskill NY (US)

Lawrence A. Clevenger of Saratoga Springs NY (US)

Hosadurga Shobha of Niskayuna NY (US)

Huai Huang of Clifton Park NY (US)

Local VDD And VSS Power Supply Through Dummy Gates with Gate Tie-Downs and Associated Benefits - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240136287 titled 'Local VDD And VSS Power Supply Through Dummy Gates with Gate Tie-Downs and Associated Benefits

Simplified Explanation

The integrated circuit structure described in the patent application includes a power supply rail formed in the backside of a semiconductor wafer, connected to a frontside BEOL wire layer through a gate that can be powered off by a power supply coupled through the gate from the power supply rail.

• Power supply rail formed in the backside of a semiconductor wafer
• Gate in the semiconductor wafer
• Frontside BEOL wire layer connected to the power supply rail through the gate

• • Potential Applications:**

- Power management in integrated circuits - Improved efficiency in power distribution within semiconductor devices

• • Problems Solved:**

- Efficient power supply distribution - Reduction of power consumption in integrated circuits

• • Benefits:**

- Enhanced performance of integrated circuits - Increased reliability in power supply distribution

• • Potential Commercial Applications:**

• Optimizing Power Supply Distribution in Semiconductor Devices*

• • Possible Prior Art:**

There may be prior art related to power supply distribution in integrated circuits, but specific examples are not provided in the abstract.

• • Unanswered Questions:**

1. How does the gate function to control the power supply distribution? 2. What specific types of integrated circuits would benefit most from this technology?

Original Abstract Submitted

an integrated circuit structure includes a power supply rail formed in a backside of a semiconductor wafer. the integrated circuit structure also includes a frontside beol wire layer connected to the power supply rail through a gate, wherein the gate is of a type to be powered off by a power supply coupled through the gate from the power supply rail to the first frontside beol wire layer. a method of forming an integrated circuit structure includes forming a power supply rail in a backside of a semiconductor wafer, forming a gate in the semiconductor wafer, and forming a frontside beol wire layer connected to the power supply rail through the gate. again, the gate is of a type to be powered off by a power supply coupled through the gate from the power supply rail to the first frontside beol wire layer.