International business machines corporation (20240099035). DOUBLE-SIDED EMBEDDED MEMORY ARRAY simplified abstract

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DOUBLE-SIDED EMBEDDED MEMORY ARRAY

Organization Name

international business machines corporation

Inventor(s)

Wu-Chang Tsai of Albany NY (US)

Ailian Zhao of Slingerlands NY (US)

Ashim Dutta of Clifton Park NY (US)

Chih-Chao Yang of Glenmont NY (US)

DOUBLE-SIDED EMBEDDED MEMORY ARRAY - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240099035 titled 'DOUBLE-SIDED EMBEDDED MEMORY ARRAY

Simplified Explanation

A semiconductor structure is presented that integrates two different types of memory devices into a single CMOS chip by connecting a first memory array and a second memory array with nanosheet stacks and backside contacts.

  • The first memory array and second memory array are directly connected by nanosheet stacks.
  • The structure defines a double-sided memory array on a CMOS wafer.
  • The nanosheet stacks separate the two memory arrays, allowing for integration of different memory devices.

Potential Applications

This technology could be applied in:

  • High-performance computing
  • Data storage solutions
  • Mobile devices

Problems Solved

This innovation addresses:

  • Integration challenges of different memory devices
  • Space constraints in semiconductor design

Benefits

The benefits of this technology include:

  • Increased memory capacity
  • Enhanced performance
  • Efficient use of space on a chip

Potential Commercial Applications

The potential commercial applications of this technology could be in:

  • Semiconductor manufacturing
  • Memory chip production
  • Consumer electronics industry

Possible Prior Art

One possible prior art for this technology could be the integration of different memory devices on a single chip using traditional interconnect methods.

Unanswered Questions

How does this technology impact power consumption in devices?

The article does not provide information on the power consumption implications of integrating two different memory devices on a single chip.

What are the potential challenges in scaling this technology for mass production?

The article does not address the scalability challenges that may arise when implementing this technology on a larger scale for commercial production.


Original Abstract Submitted

a semiconductor structure is presented including a first memory array and a second memory array directly connected to the first memory array by nanosheet stacks and backside contacts. the first and second memory arrays collectively define a double-sided memory array on a complementary metal oxide semiconductor (cmos) wafer. the nanosheet stacks separate the first memory array from the second memory array so that two different types of memory devices are integrated together into a single cmos chip.