Intel corporation (20240112962). DESIGN OF VOLTAGE CONTRAST PROCESS MONITOR simplified abstract

DESIGN OF VOLTAGE CONTRAST PROCESS MONITOR

Organization Name

intel corporation

Inventor(s)

Xiao Wen of Beaverton OR (US)

Dipto Thakurta of Portland OR (US)

Sairam Subramanian of Portland OR (US)

David Sanchez of Portland OR (US)

Amit Paliwal of Hillsboro OR (US)

DESIGN OF VOLTAGE CONTRAST PROCESS MONITOR - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240112962 titled 'DESIGN OF VOLTAGE CONTRAST PROCESS MONITOR

Simplified Explanation

The apparatus disclosed in the patent application is for alignment detection, with devices on a substrate having process monitor structures with different offsets from a target value. Electrically conductive traces on the substrate are coupled with the devices, but not directly with each other.

• The patent application describes an apparatus for alignment detection with process monitor structures on a substrate.
• The apparatus includes electrically conductive traces that are coupled with the devices but not with each other.

Potential Applications

This technology could be used in:

• Semiconductor manufacturing for alignment detection and process monitoring.

Problems Solved

This technology helps in:

• Ensuring accurate alignment in manufacturing processes.
• Monitoring and adjusting processes based on deviations from target values.

Benefits

The benefits of this technology include:

• Improved accuracy in alignment detection.
• Enhanced process monitoring capabilities.

Potential Commercial Applications

A potential commercial application for this technology could be:

• Selling the apparatus to semiconductor manufacturing companies for use in their production processes.

Possible Prior Art

One possible prior art for this technology could be:

• Similar alignment detection systems used in semiconductor manufacturing processes.

How does this technology compare to existing alignment detection systems in terms of accuracy and efficiency?

This question is not directly addressed in the patent application. However, it would be important to compare the performance of this technology with existing systems to understand its advantages.

What are the potential limitations or challenges in implementing this technology in real-world manufacturing processes?

The patent application does not discuss any limitations or challenges in implementing this technology. Understanding these factors would be crucial for successful adoption and integration into manufacturing operations.

Original Abstract Submitted

embodiments disclosed herein include an apparatus for alignment detection. in an embodiment, the apparatus comprises a substrate, and a plurality of devices on the substrate, where each of the plurality of devices comprises a process monitor structure with different offsets from a target value. in an embodiment, a plurality of electrically conductive traces are on the substrate, where each of the plurality of electrically conductive traces has a first end and a second end opposite the first end, and where each of the plurality of electrically conductive traces is electrically coupled at the first end, respectively, with each of the plurality of devices. in an embodiment, the second end of the each of the plurality of electrical traces is within a scan area on the substrate, and where the each of the plurality of electrically conductive traces are not directly electrically coupled with each other.